Article re-posted with permission from Parker Hannifin Sealing & Shielding Team.
Original content can be found on Parker’s Website and was written by Nathaniel Reis, Applications Engineer for Parker O-Ring & Engineered Seals Division.

Critical Environments
When it comes to the seal industry, the semiconductor market is well known as one where the most premium, chemical-resistant compounds are a necessity. Microelectronic manufacturing processes involve chemistries that push the limits of what elastomeric compounds can withstand in terms of both chemical aggressiveness and variety. The perfluorinated materials (FFKM) capable of withstanding these environments require intricate manufacturing processes regulated by closely-guarded trade secrets and the significant investment of resources.
These factors drive the price of FFKM compounds to the point of being as much as 50 times the cost of any other variety. Cutting just a slice out of this cost can result in significant savings – a chance to take out a quarter or even half the pie would be advantageous to the overall bottom line. Fabricators should be continually on the lookout for more cost-effective compounds that show equal performance in their pertinent operations.

Not only can HiFluor be used where even FKM is lacking, but its performance in applications with aggressive plasma exposure is spectacular as well. This can be observed by its overall resistance to plasma-induced material degradation. However, Parker has also developed multiple formulations that display extremely low particle generation when most materials would be expected to suffer severe physical and chemical etch.
Solutions and Cost Savings
As an example: One major semiconductor fab had several factors (other than their seals) dictating the frequency of their preventative maintenance (PM) intervals. The fab wanted to replace their seals at these intervals as a precautionary measure to limit the chance of them becoming another PM-increasing factor. However, this caused these premium FFKM seals to be a source of inflated cost. Parker assisted with a process evaluation that resulted in over half the seals being replaced with cost-effective HiFluor O-rings, while the tool regions with more intense plasma exposure were reserved for the elite performance of Parker’s FF302.
Another major fab in the microelectronics industry switched from FKM to FFKM seals in their oxide etch process. The tool owner achieved the desired performance improvement, but soon began searching for less expensive options. The owner recognized the plasma resistance and low particulate generation of Parker’s HiFluor compound, HF355. After implementing this change, he retained the performance improvement, but at a fraction of the cost.
Semiconductor tool owners understand that their aggressive processes require the most robust, expensive FFKM seal materials. The price tag on these seals is greater than those from any other compound family. Fortunately, HiFluor is a proven sealing solution that can bridge the gap and provide the same kind of high performance at a much lower cost.
For more information about Parker O-Rings, including HiFluor, or to find a custom solutions for your application, contact Gallagher Fluid Seals today.

